YTTRIA COAT TUBE
CVD Yttria coating
Titanium dioxide Nanomesh
Atmospheric CVD apparatus
CVD Yttria coatingCorrosive halogen gas has widely used in such dry etching and plasma CVD processes of semiconductor manufacturing, so that surface of chambers requires good plasma resistance. The use of the plasma resistive wall makes it possible to avoid the generation of particles by restraining the corrosion. Tokita CVD systems offers the yttria (Y2O3) film receiving considerable attention as the superior resistive wall.
FeaturesHigh density, being characteristic of the films prepared by the CVD method.
Superior Halogen resistance
High grede in purity
Excellent performance of step coverage
Plasma Resistance Evaluation
CVD Yttria coating SHILD-C2 (PDF:640KB)
Size and shapeRing, plate and pipe substrates are available.
Maxmum size >> diamater : Ø500 mm for disk. Height : 200mm.
* The stepped structure is applicable, if curvature, R, is suitable.
For the coating of the stepped terraces or the side surface, please contact us.
The applicable number of the sample is not limited.
Maximum size is Ø500 mm for disk.
The price depends upon the feature size and the materials.
The delivery date will depend upon the feature size and the materials.
For more information, please contact us.