CVD Yttria coating
Oxide coating
Titanium dioxide Nanomesh
Atmospheric CVD apparatus
About us
Japanese Site
Related links

Atmospheric CVD apparatus

Atmospheric CVD apparatus requires no vacuum apparatus. This apparatus can synthesize various high-quality coatings such as transparent conductive ZnO, plasma resistive Y2O3 and photocatalytic TiO2 films.
Optional swinging module: the film thickness uniformity is improved.

Product |Atomspheric CVD system (PDF : 573KB)


Power supply AC 200V (single phase)
Size 1024 mm (W) × 738 mm (D) × 1825 mm (H)
Heating substrate stage Maximum 700°C, 110 x 100 mm
Heating temperature 350 ∼ 650°C *1
Effective deposition area 25 x 25mm
Film thickness uniformity ≤±10%
Vaporizer 1 unit (standard), 2 or 3 units (optional) *2
Heating stage SUS316L
*1 The temperature is subject to change with materials and customer's requirements.
*2 The maximum temperature of the vaporizer(200 or 300°C) is optionally selected.
Left : two vaporizer unit

The multiple vaporizer system makes it possible to
prepare various composite films.
e.g., ZnO:Al, Y2O3:Eu

For more information, please contact us.
For customization, please contact us.